High-fidelity large area nano-patterning of silicon with femtosecond light sheet

dc.contributor.authorSidhu, M.S.
dc.contributor.authorMunjal, P.
dc.contributor.authorSingh, K.P.
dc.date.accessioned2020-11-25T10:47:10Z
dc.date.available2020-11-25T10:47:10Z
dc.date.issued2018
dc.description.abstractWe employ a femtosecond light sheet generated by a cylindrical lens to rapidly produce high-fidelity nano-structures over large area on silicon surface. The Fourier analysis of electron microscopy images of the laser-induced surface structures reveals sharp peaks indicating good homogeneity. We observed an emergence of second-order spatial periodicity on increasing the scan speed. Our reliable approach may rapidly nano-pattern curved solid surfaces and tiny objects for diverse potential applications in optical devices, structural coloring, plasmonic substrates and in high-harmonic generationen_US
dc.identifier.citationApplied Physics A: Materials Science and Processing, 124(1)en_US
dc.identifier.otherhttps://doi.org/10.1007/s00339-017-1459-3
dc.identifier.urihttps://link.springer.com/article/10.1007/s00339-017-1459-3
dc.identifier.urihttp://hdl.handle.net/123456789/2212
dc.language.isoenen_US
dc.publisherSpringer-Verlagen_US
dc.subjectUltrashort Laser Pulsesen_US
dc.subjectNanostructuresen_US
dc.subjectElectron microscopy imagesen_US
dc.subjectNano Patterningen_US
dc.titleHigh-fidelity large area nano-patterning of silicon with femtosecond light sheeten_US
dc.typeArticleen_US

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