Universality of Interfacial Superconductivity in Heavily Doped Silicon

dc.contributor.authorMounand, Monika
dc.contributor.authorSirohi, Anshu
dc.contributor.authorSheet, Goutam
dc.date.accessioned2023-08-16T07:55:25Z
dc.date.available2023-08-16T07:55:25Z
dc.date.issued2021
dc.descriptionOnly IISERM authors are available in the recorden_US
dc.description.abstractSilicon, the second most abundant element on earth, has been an ideal candidate for semiconductor industry. Recently, it was shown that a superconducting phase with a large critical temperature Tc ∼ 10 K emerges locally under mesoscopic point contacts on silicon with non-superconducting metals. The superconducting phase can be realized on silicon crystals only above a threshold doping level. Here, we show that above the threshold level, the superconducting phase emerges for both electron and hole doping and the Tc remains insensitive to the type of carriers (electrons and holes). In addition, we also show that the superconducting phase can be realized on all accessible facets in commercially available silicon single crystals and tips of various elemental metals including ferromagen_US
dc.identifier.citationACS Applied Electronic Materials, 3(4), 1594–1600.en_US
dc.identifier.urihttps://doi.org/10.1021/acsaelm.0c01097
dc.identifier.urihttp://hdl.handle.net/123456789/4720
dc.language.isoen_USen_US
dc.publisherACS Publicationsen_US
dc.subjectSpectroscopyen_US
dc.subjectCritical constantsen_US
dc.subjectSiliconen_US
dc.subjectMagnetic propertiesen_US
dc.subjectDopingen_US
dc.titleUniversality of Interfacial Superconductivity in Heavily Doped Siliconen_US
dc.typeArticleen_US

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