
Please use this identifier to cite or link to this item:
http://hdl.handle.net/123456789/2212
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DC Field | Value | Language |
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dc.contributor.author | Sidhu, M.S. | - |
dc.contributor.author | Munjal, P. | - |
dc.contributor.author | Singh, K.P. | - |
dc.date.accessioned | 2020-11-25T10:47:10Z | - |
dc.date.available | 2020-11-25T10:47:10Z | - |
dc.date.issued | 2018 | - |
dc.identifier.citation | Applied Physics A: Materials Science and Processing, 124(1) | en_US |
dc.identifier.other | https://doi.org/10.1007/s00339-017-1459-3 | - |
dc.identifier.uri | https://link.springer.com/article/10.1007/s00339-017-1459-3 | - |
dc.identifier.uri | http://hdl.handle.net/123456789/2212 | - |
dc.description.abstract | We employ a femtosecond light sheet generated by a cylindrical lens to rapidly produce high-fidelity nano-structures over large area on silicon surface. The Fourier analysis of electron microscopy images of the laser-induced surface structures reveals sharp peaks indicating good homogeneity. We observed an emergence of second-order spatial periodicity on increasing the scan speed. Our reliable approach may rapidly nano-pattern curved solid surfaces and tiny objects for diverse potential applications in optical devices, structural coloring, plasmonic substrates and in high-harmonic generation | en_US |
dc.language.iso | en | en_US |
dc.publisher | Springer-Verlag | en_US |
dc.subject | Ultrashort Laser Pulses | en_US |
dc.subject | Nanostructures | en_US |
dc.subject | Electron microscopy images | en_US |
dc.subject | Nano Patterning | en_US |
dc.title | High-fidelity large area nano-patterning of silicon with femtosecond light sheet | en_US |
dc.type | Article | en_US |
Appears in Collections: | Research Articles |
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